SiO2薄膜热应力模拟计算，是薄膜模拟技术的-Simulation of thermal stress SiO2 film is film simulation technology

用Fortran写的薄膜结构有限元求解器，包括多种平面和曲面单元，并考虑薄膜褶皱和索段松弛现象-The film structure written in Fortran finite element solver, including a variety of flat and curved unit, and to consider the relaxation phenomenon of the membrane folds and cable segment