使用zernike多项式进行光学像差的拟合，从而进行光学镜面像差的分析，有助于提高光学系统的加工精度。(The Zernike polynomial is used to fit the optical aberration, and the analysis of optical mirror aberration is helpful to improve the machining precision of the optical system.)

使用zernike多项式进行光学镜面的像差拟合，方便对光学镜面或者眼睛诊治过程中的监控和光学像差信息的控制。(The Zernike polynomial is used to fit the aberration of the optical mirror. It is convenient to control the monitoring and optical aberration information during the diagnosis and treatment of the