用HF +HNO3 溶液蚀刻单晶硅表面,通过扫描电镜表征其形貌和厚度变化,研究了蚀刻液浓度、蚀刻时间及温度对单晶硅化学蚀刻行为的影响-Etched with HF+ HNO3 solution, silicon surfaces by scanning electron microscopy to characterize the morphology and thickness, the concentration of the etching solution, etching time a

纸张计数MATLAB源码，采用数学形态学原理实现。要求纸张码放整齐。计数精度很高。-Paper count MATLAB source, using the principle of mathematical morphology to achieve. Paper neatly stacked. High counting accuracy.